Vacuum vapor-deposition apparatus and method of producing vapor-deposited film
US7754015B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 21, 2005 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Dec 22, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/562
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means equalizes the circumference velocity v1 of the coating roll and the circumference velocity v2 of the takeup guide roll. Hence, v1=v2. Therefore, the takeup guide roll never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.