Process for preparing carbon nanostructures with tailored properties and products utilizing same
US7754183B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2005 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Sep 1, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/843
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention discloses a relatively simple CVD method for forming specifically tailored carbon-based nanostructures. In general, the method is a chemical vapor deposition method in which at least a portion of the precursor materials are provided as a liquid at atmospheric conditions. The precursor materials include at least one carbon source and at least one catalyst source. Optionally, the precursor materials can also include one or more dopant sources. The carbon source and the optional dopant source can be injected as liquids into the system, and the liquid catalyst source can be either injected into the system or located on a substrate in the reactor prior to the process. Very high yield of nanostructures exhibiting particular characteristics can be attained by the process. Control of electrical characteristics as well as structural characteristics of the products are possible via control of process parameters including the particular precursors used as well as the relative amounts of the precursors used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.