Films with superior impact resistance and improved catastrophic failure resistance under high strain rate
US7754341B2 · kind B2 · utility
1Cited by
30References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 29, 2004 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Mar 2, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31938
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Stretch films which exhibit good puncture and impact resistance while also exhibiting resistance to defect propagation are desired. The films of the present invention have an ultimate stretch of at least 200 percent, a dart impact strength of at least about 700 gms/mil and a catastrophic failure stretch of at least 95 percent of the elongation to break value (CF of 5 or less). The films preferably comprise at least 3 layers and preferably comprise at least 50 percent by weight of polyethylene polymers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.