Manufacturing method for the integration of nanostructures into microchips
US7754608B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | May 26, 2005 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Sep 16, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/891
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
State-of-the-art synthesis of carbon nanostructures (25) by chemical vapor deposition involve heating a catalyst material to high temperatures up 700-1000° C. in a furnace and flowing hydrocarbon gases through the reactor over a period of time. In order to enable a self assembly of nanostructures (25) on microchips (10) without damaging the microchip (10) by high temperatures the proposed manufacturing method comprises: A layer (1) contains indentations (3) on which nanostructures (25) are to be integrated and the indentations (3) are heated up by a current (I) conducted to the layer (1) via contact pads (2).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.