Patent · US Active

Low-irritation compositions and methods of making the same

US7754667B2 · kind B2 · utility

10Cited by
29References
32Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 5, 2006
Grant dateJul 13, 2010
Priority date
Expiry dateJul 24, 2027

Classification

  • Technology area (CPC A)Human Necessities
  • CPC primaryA61K2800/75
  • WIPO fieldPharmaceuticals
  • WIPO sectorChemistry

Abstract

Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.