Resist pattern processing equipment and resist pattern processing method
US7755064B2 · kind B2 · utility
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2References
11Claims
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Key dates
| Filing date | Mar 7, 2007 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Jun 7, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/906
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A resist pattern processing apparatus comprises a stage for mounting a substrate having a patterned photoresist arranged on a surface thereof, a UV-emitting part for emitting UV rays to the stage, and an annular member for surrounding the whole periphery of the substrate. This allows the annular member to restrain ozone supplied near a mounting surface for the substrate on the stage from diffusing to the periphery of the stage, whereby the ozone concentration becomes even in the surface of the substrate mounted on the stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.