Method of depositing a thermal barrier by plasma torch
US7763328B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2007 |
| Grant date | Jul 27, 2010 |
| Priority date | — |
| Expiry date | Feb 21, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31504
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to the field of methods of depositing a material on a substrate. It relates to a method of depositing, onto a substrate, a material that acts as a thermal barrier and that prior to deposition is in powder form. The powder is introduced into the plasma jet of a first plasma torch and into the plasma jet of at least one second plasma torch, the first plasma torch and at least the second plasma torch being disposed in an enclosure and oriented in such a manner that their plasma jets cross, so as to create a resultant plasma jet in which the powder is vaporized, the substrate being placed on the axis of the resultant plasma jet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.