High power EUV lamp system
US7763872B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2006 |
| Grant date | Jul 27, 2010 |
| Priority date | — |
| Expiry date | Oct 9, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/009
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.