Method and system for providing basal profile modification in analyte monitoring and management systems
US7766829B2 · kind B2 · utility
477Cited by
1,004References
26Claims
0Family size
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Key dates
| Filing date | Nov 4, 2005 |
| Grant date | Aug 3, 2010 |
| Priority date | — |
| Expiry date | Jun 15, 2027 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61M2230/201
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Method and system for providing basal profile modification in insulin therapy for use with infusion devices includes periodically monitoring the analyte levels of a patient for a predetermined period of time in order to determine, based on the monitored analyte levels, an appropriate modification factor to be incorporated into the underlying basal profile which was running at the time the periodic monitoring of the analyte levels were performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.