Method of making a photovoltaic device with antireflective coating
US7767253B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 9, 2007 |
| Grant date | Aug 3, 2010 |
| Priority date | — |
| Expiry date | Mar 26, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of making an anti-reflection coating using a sol-gel process, for use in a photovoltaic device or the like. The method may include the following steps in certain example embodiments: forming a polymeric component of silica by mixing silane(s) with one or more of a first solvent, a catalyst, and water; forming a silica sol gel by mixing the polymeric component with a colloidal silica, and optionally a second solvent; forming a metal oxide sol by mixing silane(s) with a metal oxide, a second catalyst, and a third solvent; forming a combined sol by mixing the metal oxide sol with the silica sol; casting the mixture by spin coating or the like to form a silica and metal oxide containing layer on a substrate; and curing and/or heat treating the layer. This layer may make up all or only part of an anti-reflection coating which may be used in a photovoltaic device or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.