Large-scale colloidal crystals and macroporous polymers and method for producing
US7767720B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Nov 1, 2004 |
| Grant date | Aug 3, 2010 |
| Priority date | — |
| Expiry date | Jun 20, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249953
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Single domain wafer-scale colloidal crystals and macroporous polymers are formed by dispersing concentrated solutions of colloids, desirably mondisperse silica colloids, in a viscous monomer, desirably ethoxylated trimethylolpropane triacrylate, and spin-coating them onto a substrate. Subsequent photopolymerization produces three-dimensionally ordered colloidal crystals trapped inside a polymer matrix. Selective removal of the polymer matrix, such as by oxygen plasma treatment, or removal of the silica spheres, such as by wet etching, produces large-area colloidal crystals and macroporous polymers, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.