Patent · US Active

Electron beam irradiation method, electron beam irradiation apparatus, and electron beam irradiation apparatus for open-mouthed container

US7767987B2 · kind B2 · utility

8Cited by

2References

17Claims

0Family size

Assignee

Japan AE Power Systems Corporation · JP

Inventors

Shiro Eguchi · Chuo, JP
Isao Hashimoto
Shigekatsu Sato · Hitachi, JP
Hidenobu Koide · Kawasaki, JP
Nobuyuki Hashimoto · Iruma, JP
Takayuki Suzuki · Yokohama, JP
Satoru Gozaki · Ichihara, JP
Tomoyuki Hikosaka · Ichihara, JP
Yukio Okamoto · Hachioji, JP
Hiroyuki Fujita · Osaka, JP

Key dates

Filing date	Sep 21, 2006
Grant date	Aug 3, 2010
Priority date	—
Expiry date	May 21, 2027

Classification

Technology area (CPC A)Human Necessities
CPC primaryA61L2202/23
WIPO fieldHandling
WIPO sectorMechanical engineering

Abstract

There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (30) (object) within a magnetic barrier (MF) formed by combining a plurality of magnetic fields generated in an electron beam application region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.