Photo detector unit and exposure apparatus having the same
US7768625B2 · kind B2 · utility
0Cited by
27References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 23, 2006 |
| Grant date | Aug 3, 2010 |
| Priority date | — |
| Expiry date | Apr 1, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7019
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes (a) a projection optical system to project a reticle pattern onto a plate by using a light from a light source, and (b) a photo detector unit to detect the light via the projection optical system. The photo detector unit includes (i) a substrate, which is patterned with a wiring pattern and transmits the light, (ii) a detector to detect the light, and (iii) a bump to space the substrate from the detector, and to electrically connect the detector and the wiring pattern of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.