Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method
US7771905B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2006 |
| Grant date | Aug 10, 2010 |
| Priority date | — |
| Expiry date | May 13, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.