Methods for adjusting shifter width of an alternating phase shifter having variable width
US7774739B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2006 |
| Grant date | Aug 10, 2010 |
| Priority date | — |
| Expiry date | Mar 20, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In accordance with an embodiment of the invention, there is a method of designing a lithography mask. The method can comprise determining a maximum width of a shifter, wherein the maximum width corresponds to a width of a shifter for a first set of features and determining whether the shifter having the maximum width can be placed in a shifter space for a second set of features. The method can also comprise incrementally decreasing the width of the shifter to be placed into the shifter space for the second set of features when the shifter having the maximum width cannot be placed in the shifter space for a feature in the second set of features until an acceptable shifter width can be determined or until the shifter width is reduced to a predetermined minimum shifter width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.