Methods and apparatuses for depositing nanometric filamentary structures
US7776384B2 · kind B2 · utility
2Cited by
6References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2006 |
| Grant date | Aug 17, 2010 |
| Priority date | — |
| Expiry date | Apr 17, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The invention relates to a method for monitoring the production of nanometric filamentary structures. The method comprises passing a gaseous phase comprising nanometric filamentary structures through a space defined between at least two electrodes generating an electric field for causing an increase of current between the electrodes and analyzing behavior of the current over a predetermined period of time and/or analyzing at least one of the size, density and shape of the nanometric filamentary structures or aggregates thereof present in the gaseous phase.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.