Patent · US Active

Phase change memory cell and method and system for forming the same

US7776644B2 · kind B2 · utility

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3References
5Claims
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Key dates

Filing dateNov 10, 2006
Grant dateAug 17, 2010
Priority date
Expiry dateOct 13, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/8828

Abstract

For fabricating a phase change memory cell, a layer of phase change material and a layer of a first electrode material are deposited. In addition, the first electrode material is patterned using an etchant including a low-reactivity halogen element such as bromine or iodine to form a first electrode. By using the low-reactivity halogen element, change to the composition of the phase change material and formation of undercut and deleterious halogen by-product are avoided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.