Methods and devices for forming nanostructure monolayers and devices including such monolayers
US7776758B2 · kind B2 · utility
17Cited by
41References
16Claims
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Key dates
| Filing date | Jul 28, 2006 |
| Grant date | Aug 17, 2010 |
| Priority date | — |
| Expiry date | Oct 2, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/891
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.