Patent · US Active

Method for manufacturing divided waveplate filter

US7777154B2 · kind B2 · utility

8Cited by
40References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 21, 2005
Grant dateAug 17, 2010
Priority date
Expiry dateJan 31, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1082
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method to manufacture a divided waveplate filter by laser irradiation. A material layer is formed on the surface of a substrate material. A laser oscillator programmed to form a predetermined pattern scans light to form the divided waveplates. In some embodiments, the divided waveplate material layer may be selectively removed by laser ablation. In some embodiments, the material layer has a phase-difference characteristic and the divided waveplates may be formed by removing the phase-difference characteristic of the material layer using laser light without removing the material layer itself. The material layer may be covered by a laser absorbing layer such as titanium oxide. The divided waveplate may be protected by covering the entire surface with a protective layer 6.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.