Micrometer-based measuring system and method of using same
US7779550B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 27, 2007 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Jul 19, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B3/22
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measuring system (100) for flatness degree measurement includes a measuring instrument (10) and a processing device (20). The measuring instrument has a base (12), a guide column (14), a sliding member (16), a digital micrometer (18) and a holding member (19). The guide column is vertically attached to the base. The sliding member is moveably attached to the guide column. The digital micrometer is firmly fastened to the sliding member. The holding member is configured for fixing a workpiece (40) and has a reference-standard surface formed thereon. The processing device electronically connects with the digital micrometer. The processing device receives a plurality of measured values from the digital micrometer and displays a testing result after processing the measured values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.