Copolymer and top coating composition
US7781142B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2005 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Oct 2, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/1811
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000,wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.