Method and system for controllable deposition of nanoparticles on a substrate
US7781350B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2006 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | Mar 27, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/962
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method and system for controllable electrostatic-directed deposition of nanoparticles from the gas phase on a substrate patterned to have p-n junction(s), a bias electrical field is reversely applied to the p-n junction, so that uni-polarly charged nanoparticles are laterally confined on the substrate by a balance of electrostatic, van der Waals and image forces and are deposited on a respective p-doped or n-doped regions of the p-n junction when the applied electric field reaches a predetermined strength. The novel controllable deposition of nanoparticles employs commonly used substrate architectures for the patterning of an electric field attracting or repelling nanoparticles to the substrates and offers the opportunity to create a variety of sophisticated electric field patterns which may be used to direct particles with greater precision.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.