Method and apparatus for analyzing an optical device
US7782449B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2007 |
| Grant date | Aug 24, 2010 |
| Priority date | — |
| Expiry date | May 16, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0207
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Described are a method and apparatus for analysing an optical device, including: a) arranging an illuminating device which generates a test beam, the optical device that the test beam passes and a position-resolving sensor device which detects the test beam, relative to each other in a reference position that establishes a reference beam path; b) transmitting the test beam in a plurality of relative positions off set with respect to the reference position, relative to the reference position, the test beam being incident upon a measuring point assigned to the respective relative position on the optical device; c) detecting, for a respective relative position, a position of incidence of the test beam, after it passes the optical device, on one or a plurality of planes of detection offset relative to each other; d) determining the beam path of the test beam from the positions of incidence detected in step c) for each relative position and calculating optical characteristics of the optical device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.