Patent · US Active

Laser apparatus and production method of laser apparatus

US7782918B2 · kind B2 · utility

1Cited by

2References

1Claims

0Family size

Assignee

Canon Kabushiki Kaisha · JP

Inventors

Kenji Tamamori · Ebina, JP
Shinan Wang · Kashiwa, JP

Key dates

Filing date	Sep 8, 2008
Grant date	Aug 24, 2010
Priority date	—
Expiry date	Feb 20, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01S5/183
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Provided are a laser apparatus into which a large current can be injected and a production method which enables easy production of the apparatus. A laser apparatus includes a light-emitting region on a substrate, and a periodic refractive index structure containing an i-type material provided at a periphery of the light-emitting region. Another laser apparatus includes a light-emitting region between a first electrode and a second electrode on a substrate, wherein at least one of the first and the second electrodes includes a periodic refractive index structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.