Method of gas resistance test for image and ink set
US7784367B2 · kind B2 · utility
4Cited by
6References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 2005 |
| Grant date | Aug 31, 2010 |
| Priority date | — |
| Expiry date | Nov 30, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D11/40
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Gas resistance of an image is evaluated by placing the image in a mixed gas atmosphere containing at least ozone and nitrogen dioxide. The mixed gas atmosphere is controlled such that the concentrations of ozone and nitrogen dioxide are not less than 75 ppb and not less than 150 ppb, respectively, and the mixed gas is continuously supplied to the surface of a sample bearing the image at a flow rate not less than 0.2 m/s and not more than 3.0 m/s.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.