Microfluidic device with controlled substrate conductivity
US7790116B2 · kind B2 · utility
6Cited by
11References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2007 |
| Grant date | Sep 7, 2010 |
| Priority date | — |
| Expiry date | Dec 27, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/2575
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method to achieve controlled conductivity in microfluidic devices, and a device formed thereby. The method comprises forming a microchannel or a well in an insulating material, and ion implanting at least one region of the insulating material at or adjacent the microchannel or well to increase conductivity of the region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.