Positive type dry film photoresist
US7790345B2 · kind B2 · utility
0Cited by
8References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2005 |
| Grant date | Sep 7, 2010 |
| Priority date | — |
| Expiry date | Dec 7, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/09
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive type photoresist resin film includes a support film and a thermosetting positive type photoresist resin layer laminated over the support film. The positive type photoresist resin layer contains alkali soluble resin, a diazide based photosensitive compound and a sensitivity enhancer. The support film has a surface roughness that inhibits the formation of defect structures such as fish eye. The invention overcomes process inefficiencies and defects cause by spin coating photoresist technologies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.