Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays

US7790389B2 · kind B2 · utility

Assignee

• AFFYMETRIX, INC. · US

Inventors

• Mark Trulson · San Jose, US
• Glenn McGall · Mountain View, US
• Bei-Shen Sywe · Cupertino, US
• Lisa Kajisa · Palo Alto, US
• Dana Truong · San Jose, US
• Richard P. Rava · San Jose, US
• Martin J. Goldberg · Saratoga, US

Key dates

• Filing date: Jan 16, 2008
• Grant date: Sep 7, 2010
• Expiry date: May 4, 2028

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C40B40/06
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.