Scanned beam display having high uniformity and diminished coherent artifacts
US7791810B2 · kind B2 · utility
139Cited by
1References
13Claims
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Key dates
| Filing date | Dec 21, 2007 |
| Grant date | Sep 7, 2010 |
| Priority date | — |
| Expiry date | Mar 5, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Briefly, in accordance with one or more embodiments, time averaged Moiré patterns may be utilized in a scanned beam display having a Gaussian beam profile or the like in order to tailor uniformity of the image by controlling both the near field and far field regions of the display to result in a stable and uniform scanned beam display image. Consideration is made regarding the light source parameters of focus numerical aperture, profile, shape, and/or wavelength to achieve higher uniformity and stability without resulting in significant visible coherent artifacts such as tiled intensity patterns and/or Moiré.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.