Film formation method, electro-optical device manufacturing method and electronic apparatus
US7794781B2 · kind B2 · utility
1Cited by
2References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 17, 2006 |
| Grant date | Sep 14, 2010 |
| Priority date | — |
| Expiry date | Nov 8, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133784
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A film formation method includes: ejecting liquid onto a substrate; and drying the liquid ejected onto the substrate by a drying device before an amount of a solvent evaporation of the liquid exceeds 40%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.