Micro-electro-mechanical systems (MEMS) device and process for fabricating the same
US7795063B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2007 |
| Grant date | Sep 14, 2010 |
| Priority date | — |
| Expiry date | Sep 28, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0735
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A micro-electro-mechanical systems (MEMS) device includes a back-plate substrate, having an intended region formed with a plurality of perforating holes. A first structural dielectric layer, disposed on the back-plate substrate, wherein the dielectric layer having an opening above the intended region. An etching stop layer, disposed over the first structural dielectric layer. A second structural dielectric layer, formed over the back-plate substrate. The etching stop layer and the second structural dielectric layer form at least a part of a micro-machine diaphragm, and cover over the opening of the first structural dielectric layer to form a chamber between the micro-machine diaphragm and the back-plate substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.