Controlled plasma power supply
US7795817B2 · kind B2 · utility
37Cited by
41References
37Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 21, 2007 |
| Grant date | Sep 14, 2010 |
| Priority date | — |
| Expiry date | Nov 10, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.