Mask film to form relief images and method of use
US7799504B2 · kind B2 · utility
8Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 5, 2007 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Aug 17, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24942
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask-forming film has a transparent layer between the imageable layer and the carrier sheet, which transparent layer has a refractive index that is lower (by at least 0.04) than that of the carrier sheet or any immediately adjacent layer between it and the carrier sheet. This lower refractive index layer modifies the path of incident radiation during mask image transfer so as to provide steeper shoulder angles in the relief image solid areas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.