Patent · US Active

Stabilized, non-aqueous cleaning compositions for microelectronics substrates

US7799749B2 · kind B2 · utility

2Cited by
5References
16Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 31, 2007
Grant dateSep 21, 2010
Priority date
Expiry dateAug 16, 2027

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/22
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Non-aqueous stripping and cleaning compositions for cleaning microelectronics devices, the composition having a least one organic sulfur-containing polar compound as a stripping solvent, at least one water-free source of a strong hydroxide base, and at least one hydroxypyridine stabilizing agent to inhibit detrimental side reactions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.