Methodology for substrate fluorescent non-overlapping dot design patterns for embedding information in printed documents
US7800785B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 29, 2007 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Dec 19, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M3/144
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The teachings as provided herein relate to a watermark embedded in an image, and methodology for same, that has the property of being relatively indecipherable under normal light, and yet decipherable under UV light. This fluorescent mark comprises a substrate containing optical brightening agents, and a first dot design printed as an image upon the substrate. The first dot design has as a characteristic, the property of strongly suppressing substrate fluorescence. A second dot design having a property of providing a differing level of substrate fluorescence suppression from that of the first dot design such that when rendered in close spatial proximity with the first dot design image print, the resultant image rendered substrate suitably exposed to an ultra-violet light source, will yield a discernable image evident as a fluorescent mark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.