Apparatus for treating particulate material
US7802376B2 · kind B2 · utility
7Cited by
195References
12Claims
0Family size
Inventor
Key dates
| Filing date | Nov 4, 2005 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Nov 19, 2027 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B17/107
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
An apparatus for treating particulate material has a process chamber for receiving and treating the material. A bottom is composed of a plurality of overlapping guide plates which are placed one above the other and between which annular slots for process air to pass through are formed. An annular-gap nozzle is arranged centrally in the bottom, the orifice of this annular-gap nozzle being designed in such a way that a planar spray pancake which runs approximately parallel to the bottom plane can be sprayed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.