Device for plasma-activated vapor coating of large surfaces

US7803255B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Manfred Neumann · Marl, DE
• Steffen Straach · Dresden, DE
• Mario Krug · Neustadt in Sachsen, DE
• Nicolas Schiller · Helmsdorf, DE

Key dates

• Filing date: Jun 13, 2002
• Grant date: Sep 28, 2010
• Expiry date: Oct 15, 2026

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/56
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.