System, method, and product for generating patterned illumination
US7803609B2 · kind B2 · utility
19Cited by
3References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 13, 2007 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Dec 31, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/6456
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An embodiment of a method for generating an interference pattern at a probe array is described that comprises directing light at a first waveguide and second waveguide, wherein the first and second waveguides are positioned adjacent to each other and the output from the first and second waveguides produce an interference pattern; and directing the interference pattern at the probe array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.