Tiered gate device with source and drain extensions

US7804114B1 · kind B1 · utility

Assignee

• HRL Laboratories, LLC · US

Inventors

• Ivan Milosavljevic · Thousand Oaks, US
• Adele Schmitz · Thousand Oaks, US
• Michael Antcliffe · Los Angeles, US
• Ming Hu · Beijing, CN

Key dates

• Filing date: Apr 3, 2009
• Grant date: Sep 28, 2010
• Expiry date: Apr 3, 2029

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D30/0612
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

In one embodiment, a tiered gate device is provided including a source, a drain, and a gate foot therebetween. A gate head is attached to the gate foot. A source extension extends from on an uppermost surface of the source toward the gate foot along the substrate. In some embodiments a drain extension extends from on and uppermost surface of the drain toward the gate foot along the substrate.