Atomic lasers with exciplex assisted absorption
US7804877B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 19, 2008 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Jul 16, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0943
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides in one of the embodiments for either a continuous wave (cw) or pulsed alkali laser having an optical cavity resonant at a wavelength defined by an atomic transition, a van der Waals complex within the optical cavity, the van der Waals complex is formed from an alkali vapor joined with a polarizable gas, and a pump laser for optically pumping the van der Waals complex outside of the Lorentzian spectral wings wherein the van der Waals complex is excited to form an exciplex that dissociates forming an excited alkali vapor, generating laser emission output at the wavelength of the lasing transition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.