Patent · US Active

Shape-based photolithographic model calibration

US7805699B2 · kind B2 · utility

5Cited by

59References

34Claims

0Family size

Assignee

MENTOR GRAPHICS CORPORATION · US

Inventors

Ir Kusnadi · San Jose, US
Yuri Granik · Palo Alto, US

Key dates

Filing date	Oct 11, 2007
Grant date	Sep 28, 2010
Priority date	—
Expiry date	Oct 29, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/705
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method and apparatus for determining how well a photolithographic model simulates a photolithographic printing process. A test pattern of features is printed on a wafer and the shape of the printed features is compared with the shape of simulated features produced by the model. A cost function is calculated from the comparison that quantifies how well the model simulates the photolithographic printing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.