Fabrication of slot waveguide
US7805826B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 6, 2006 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Jul 6, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49016
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating a nanometer slot waveguide comprises applying a spacer layer to a first waveguide structure, wherein the first waveguide structure includes a waveguide layer and a substrate layer and the waveguide layer has a refractive index greater than the substrate layer. A second waveguide structure is applied to the spacer layer, wherein the second waveguide structure includes a waveguide layer and a substrate layer, and the waveguide layer has a refractive index greater than the substrate layer. The substrate layer of the second waveguide structure is removed to create an intermediate waveguide structure and portions of the intermediate waveguide structure are removed to create a nanometer slot waveguide structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.