Plasma nozzle array for providing uniform scalable microwave plasma generation
US7806077B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 30, 2004 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Jul 30, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4622
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Microwave plasma nozzle array systems and methods for configuring the microwave plasma nozzle arrays are disclosed. The microwaves are transmitted to a microwave cavity in a specific manner and form an interference pattern that includes high-energy regions within the microwave cavity. The high-energy regions are controlled by the phases and the wavelengths of the microwaves. A plurality of nozzle elements is provided in the array. Each of the nozzle elements has a portion partially disposed in the microwave cavity and receives a gas for passing therethrough. The nozzle elements receive microwave energy from one of the high-energy regions. Each of the nozzle elements include a rod-shaped conductor having a tip that focuses the microwaves and a plasma is then generated using the received gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.