Plasma treatment apparatus
US7806078B2 · kind B2 · utility
454Cited by
5References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 7, 2006 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Dec 21, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma CVD apparatus has a container, and channels composed of introduction grooves and circumferential grooves for different types of gases are formed within the container. The gases introduced through source gas piping, auxiliary gas piping, and cleaning gas piping are equally supplied to a plurality of supply nozzles, a plurality of auxiliary gas supply nozzles, and a plurality of cleaning gas nozzles. The configuration of the container can be simplified without complicating pipings for the gases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.