Stimulation method
US7806182B2 · kind B2 · utility
28Cited by
12References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2008 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Jan 22, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S507/904
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A subterranean formation stimulation method utilizes a treatment fluid comprising residual drilling fluid injected into the formation, and producing the stimulated formation. In one embodiment, a tight gas formation is fractured and the fracture has a higher conductivity than the formation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.