Substrate processing system having improved substrate transport system
US7806641B2 · kind B2 · utility
6Cited by
1References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2007 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Dec 28, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67748
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing system includes a first load lock, a process chamber having a first opening to allow an exchange of a substrate between the first load lock and the first process chamber, first rollers in the process chamber; and second rollers in the first load lock, wherein the first rollers and the second rollers are configured to transport a substrate thereon through the first opening between the first load lock and the process chamber. The first rollers and the second rollers are not rotated by an active transport mechanism.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.