Patent · US Active

Formulation and method for depositing a material on a substrate

US7807070B2 · kind B2 · utility

1Cited by
3References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 9, 2008
Grant dateOct 5, 2010
Priority date
Expiry dateOct 9, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S428/917
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A formulation for depositing a material on a substrate, the formulation comprising the material to be deposited on the substrate dissolved in a solvent system comprising a first solvent component having a relatively high boiling point and which exhibits a relatively low solubility with respect to the material to be deposited, and a second solvent component having a relatively low boiling point and which exhibits a relatively high solubility with respect to the material to be deposited.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.