Imprinting apparatus and method for forming residual film on a substrate
US7807087B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2007 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Dec 14, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29L2011/0016
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.