Aqueous buffered fluoride-containing etch residue removers and cleaners
US7807613B2 · kind B2 · utility
2Cited by
18References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2004 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Apr 14, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/34
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention relates to aqueous, buffered, fluoride containing compositions having a pH of greater than 7.0 to about 11.0. In certain embodiments, the buffered compositions have an extended worklife because pH dependent attributes such as oxide and metal etch rates are stable so long as the pH remains stable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.