Heterogeneous integration of low noise amplifiers with power amplifiers or switches
US7808016B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2006 |
| Grant date | Oct 5, 2010 |
| Priority date | — |
| Expiry date | Apr 30, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/05
Abstract
A transistor heterogeneously integrating a power amplifier or switch with a low-noise amplifier having a substrate wafer selected from a group consisting of Gallium Arsenide (GaAs), Indium Phosphate (InP) and Gallium Antimonide (GaSb), the substrate wafer having a first end and a second end, a conducting layer above the first end of the substrate wafer, an isolation implant providing lateral isolation in the conducting layer, a first active layer deposited above the conducting layer and configured for the low-noise amplifier, and a buffer layer deposited above the conducting layer and configured for the low-noise amplifier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.